Tech Shout!

San Diego, California USA-based company Litel Instruments, has launched two new products called Distortion Mapper (DMAP) and Transmission Mapper (TMAP) to enhance silicon chip performance and yield in leading edge semiconductor factories.

The company, which is basically a based provider of solutions for the semiconductor photolithography community boasts that DMAP and TMAP complement an increasing list of Litel products that have found extensive application in the semiconductor manufacturing industry.

DMAP offers users the capacity to analysis and correct photolithography tool subsystems, including the precision mechanics responsible for maintaining position control of the silicon wafer. It enables the customer to independently measure lens distortion and scan sync errors, and provide customers with the necessary corrections which will attribute to overlay improvement programs demanded by chip manufacturers.

TMAP will allow customers to measure the accuracy of the Numerical Aperture of the lens, and the ability to measure the lens to uniformly transmit light from the light source to the silicon wafer. This information is essential measuring error sources in 65 nm and smaller semiconductor devices. TMAP also offers the ability to measure and correct unbalanced N.A. values among multiple scanners in manufacturing, thus reducing CD impacts, as well as measuring and monitoring lens transmission over time.

DMAP and TMAP products will be enhancements to Litel’s present product lineup of ISI and SMI products used for analyzing and optimizing lens and illumination performance of photolithography tools.

Frank D. Masciocchi, Senior Vice President of Litel Instruments said, “Our customers recognize the value of Litel products in order to maximize lithography performance. DMAP and TMAP are perfect additions, empowering our customers to measure and correct for other areas through the optical path.”